Material Sputtering with a Multi-Ion Species Plasma Focused Ion Beam

Focused Ion Beam Lithography

Nanoimprint Mold Manufacturing with Focused Ion Beam

Nanoimprint lithography (NIL) is an emerging low cost technique for reproducing sub-45 nm pattern in various applications; however, manufacturing the mold for nanoimprint has been a key challenge in expense and resolution. Focused Ion Beams (FIB) has been known for high resolution but low throughput work in TEM sample preparation, and its extremely well defined 7 nm diameter Ga beam make it als...

Design of compact microwave plasma ion sources for focused ion beam

Two types of compact microwave plasma ion sources (MWPIS) for focused ion beam (FIB) have been developed. Cavity resonator type plasma ion source is subjected to make resonant electric field in order to ignite plasma efficiently. The optimum length of resonator and antenna, and position of quartz and antenna have been designed by both simple calculation and computer simulation. The other source...

Focused Ion Beam Microscopy and Micromachining

The FIB Instrument The basic functions of the FIB, namely, imaging and sputtering with an ion beam, require a highly focused beam. A consistent tenet of any focused beam is that the smaller the effective source size, the more current that can be focused to a point. Unlike the broad ion beams generated from plasma sources, high-resolution ion beams are defined by the use of a field ionization so...

High-brightness Cs focused ion beam from a cold-atomic-beam ion source

We present measurements of focal spot size and brightness in a focused ion beam system utilizing a laser-cooled atomic beam source of Cs ions. Spot sizes as small as (2.1 ± 0.2) nm (one standard deviation) and reduced brightness values as high as (2.4 ± 0.1) × 107 A m-2 Sr-1 eV-1 are observed with a 10 keV beam. This measured brightness is over 24 times higher than the highest brightness observ...